| 摘要 |
<p>PURPOSE: A projection optical system, an exposure apparatus, and a device fabricating method are provided to reduce an incident angle and a mirror's maximum effective diameter, and maintain an appropriate divergence of the light on the mirror. CONSTITUTION: A projection optical system includes six reflective surfaces and an aperture stop arranged along an optical path between first and second reflective surfaces. The six reflective surfaces are formed with the first reflective surface(M1), the second convex reflective surface(M2), a third convex reflective surface(M3), a fourth reflective surface(M4), a fifth reflective surface(M5), and a sixth reflective surface(M6), in order of the reflecting light from the target surface. The first reflective surface has a concave shape. The fourth reflective surface has a concave shape.</p> |
