发明名称 |
SHAPED SPUTTER SHIELDS FOR IMPROVED ION COLUMN OPERATION |
摘要 |
The invention adds one or more surface contour(s) to the bombarded area(s) within ion columns to greatly reduce the likelihood that back sputtered material will reach the ion generating source. A number of different surface contours are disclosed including angled surfaces, surfaces defining cups to capture back sputtered material, pre-textured and forested surfaces. The different surfaces can be used in any combination. The reduction in back sputtered material reaching the ion source reduces the time to stability, greatly increases the working stability, and increases the lifespan of the source. |
申请公布号 |
WO2005022577(A2) |
申请公布日期 |
2005.03.10 |
申请号 |
WO2004US26228 |
申请日期 |
2004.08.13 |
申请人 |
FEI COMPANY;MGGINN, JAMES, B.;SCHWIND, GREG |
发明人 |
MGGINN, JAMES, B.;SCHWIND, GREG |
分类号 |
H01J;H01J27/00;H01J27/02;H01J37/09;H01J37/317 |
主分类号 |
H01J |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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