发明名称 ELECTROLESS GOLD PLATING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an electroless gold plating technique for performing electroless gold plating on a nickel plating under-layer formed on a conductor circuit, which effectively inhibits separation phenomenon at solder/nickel interface formed through soldering of the gold plating and the nickel plating under-layer. <P>SOLUTION: In the electroless gold plating method, the nickel plating for forming the under-layer is performed on the conductor circuit, and the electroless gold plating is performed on the nickel plating under-layer. After the nickel plating, the surface of the nickel plating under-layer is subjected to gold- or palladium-catalyzed activation treatment and subsequently to reductive gold plating. Alternatively, after the nickel plating, reductive palladium plating and electroless gold plating are successively performed. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005054267(A) 申请公布日期 2005.03.03
申请号 JP20040106494 申请日期 2004.03.31
申请人 ELECTROPLATING ENG OF JAPAN CO 发明人 WACHI HIROSHI;TOTSUKA TAKASHI
分类号 C23C18/28;C23C18/44;H01L21/60;H01L23/12;(IPC1-7):C23C18/28 主分类号 C23C18/28
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