发明名称 RADIATION-CURABLE LIQUID RESIN COMPOSITION
摘要 The invention relates to a radiation -curable liquid resin composition comprising: (A) 20-90 wt% of a urethane (meth)acrylate oligomer, and (B) 1-35 wt% of - a monomer shown by the following formula (1), wherein R<1> represents a hydrogen atom or a methyl group, R<2> and R<3> individually represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R<4> represents a hydrogen atom or a methyl group, and n represents an integer of 1-6, or - a monomer including a hydroxyl group.
申请公布号 WO2005019128(A2) 申请公布日期 2005.03.03
申请号 WO2004NL00589 申请日期 2004.08.20
申请人 DSM IP ASSESTS B.V.;JSR CORPORATION;TAKAHASHI, ATSUYA;SHIGEMOTO, TAKEO;KOMIYA, ZEN;OHARA, HIROKI 发明人 TAKAHASHI, ATSUYA;SHIGEMOTO, TAKEO;KOMIYA, ZEN;OHARA, HIROKI
分类号 C03C25/10;C08F290/06;C08G18/67;C08G18/81;C09D175/16 主分类号 C03C25/10
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