发明名称 |
RADIATION-CURABLE LIQUID RESIN COMPOSITION |
摘要 |
The invention relates to a radiation -curable liquid resin composition comprising: (A) 20-90 wt% of a urethane (meth)acrylate oligomer, and (B) 1-35 wt% of - a monomer shown by the following formula (1), wherein R<1> represents a hydrogen atom or a methyl group, R<2> and R<3> individually represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R<4> represents a hydrogen atom or a methyl group, and n represents an integer of 1-6, or - a monomer including a hydroxyl group. |
申请公布号 |
WO2005019128(A2) |
申请公布日期 |
2005.03.03 |
申请号 |
WO2004NL00589 |
申请日期 |
2004.08.20 |
申请人 |
DSM IP ASSESTS B.V.;JSR CORPORATION;TAKAHASHI, ATSUYA;SHIGEMOTO, TAKEO;KOMIYA, ZEN;OHARA, HIROKI |
发明人 |
TAKAHASHI, ATSUYA;SHIGEMOTO, TAKEO;KOMIYA, ZEN;OHARA, HIROKI |
分类号 |
C03C25/10;C08F290/06;C08G18/67;C08G18/81;C09D175/16 |
主分类号 |
C03C25/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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