METHOD FOR STRIPPING PHOTORESIST BY USING THINNER COMPOSITION HAVING EXCELLENT STRIPPING PROPERTY IN REWORK PROCESS AND EBR PROCESS

摘要

PURPOSE: A method is provided to strip various photoresists by using an inexpensive thinner composition having an excellent stripping property in a rework process and an EBR process. CONSTITUTION: The method contains the steps of: preparing the thinner composition, wherein the thinner composition comprises an acetic acid ester compound, a gamma-butyrolactone, and a non-acetate type ester compound or the thinner composition comprises an acetic acid ester compound, a gamma-butyrolactone, and a polyalcohol derivative; rotating a substrate coated with a photoresist at a first velocity and spraying the thinner composition on the substrate; and drying the thinner composition.