LITHOGRAPHY PROJECTION APPARATUS WITH OFFSETTING EFFECT OF UNEVENNESS OF PROTRUSIONS ON SUPPORT TABLE AND METHOD FOR ADJUSTING HEIGHT OF PROTRUSIONS OF THE SUPPORT TABLE

摘要

PURPOSE: A lithography projection apparatus is provided, which offsets the effect on unevenness of protrusions on a support table by adjusting the height of the protrusions of the support table. A method is also provided to adjust the height of the protrusions of the support table. CONSTITUTION: The lithography projection apparatus comprises: a beam generating system; the support table supporting an object like a substrate, a reticle, or a mask, which comprises a support face and the protrusions(24) extended from the support face, wherein the protrusions(24) support the object and at least the top of each protrusion(24) is made of integral protrusion material; a detector detecting each height deviation of the protrusions(24); a situation-selective type height-adjusting device mounted on the individual protrusion(24) to adjust the height of the protrusion material of the individual protrusion(24); a control unit adjusting the height of the protrusion material from the individually detected height deviation by controlling the height-adjusting device. And the method for adjusting the height of the protrusions(24) comprises the steps of: measuring each height deviation of the protrusions(24); and adjusting the protrusion material from the individually detected height deviation.