DISTURBANCE-FREE, RECIPE-CONTROLLED PLASMA PROCESSING SYSTEM, AND METHOD THEREOF FOR SUPPRESSING INFLUENCES DUE TO DISTURBANCE

摘要

PURPOSE: A disturbance-free, a recipe-controlled plasma processing system, and a method thereof are provided to suppress influences due to disturbance by performing a feed-back control and a feed-forward control using a monitored output of a sensor and a measured result of a processing-result measurement device. CONSTITUTION: A plasma processor(23) is used for performing a plasma processing operation for a sample located within a vacuum processing chamber. A sensor(24) is used for monitoring process parameters during a processing period of the plasma processor. A processing-result estimation model provision unit estimates a processed result by using a monitored output of the sensor and a preset processed-result estimation equation. An optimum recipe calculation model provision unit(26) calculates optimum processing conditions such that the processed result becomes a target value by using the estimated result of the processed-result estimation model. A controller is used for controlling the plasma processing system by using a recipe generated from the optimum recipe calculation model.