发明名称 INSPECTION DEVICE OF CIRCUIT PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a convenient inspection device of a circuit pattern by improving the imaging function when the image of the circuit pattern is compared and inspected. <P>SOLUTION: The device is provided with an irradiating means for irradiating the surface of a substrate having a plurality of dies where the circuit patterns are formed with a laser beam or a charged particle beam, a detection means for detecting a signal generated from the substrate by irradiation, a storage means for making the signal detected by the detection means into an image and storing it, a comparison means using the image signal of the die designated when the image signal of the die stored in the storage means is compared with a reference image signal of the other die as the reference image signal, and a discrimination means for discriminating a defect from a comparison result in the comparison means. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005044912(A) 申请公布日期 2005.02.17
申请号 JP20030201458 申请日期 2003.07.25
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NARA YASUHIKO;NOJIRI MASAAKI;HAYAKAWA KOICHI;HIROI TAKASHI
分类号 G01N21/956;G03F1/84;G03F1/86;G06F19/00;G06T1/00;G06T7/00;H01L21/027;H01L21/66 主分类号 G01N21/956
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