| 摘要 |
PROBLEM TO BE SOLVED: To facilitate the setup adjustment of an electron beam irradiation apparatus for various diameters of cylindrical substrates in a rotary feeding mechanism of the substrate in the electron beam irradiation apparatus which aims to polymerize and harden the surface layer of the cylindrical substrate of an electrophotographic photoreceptor when the distance between the surface of the cylindrical substrate and an electron beam irradiation window is adjusted, to the minimum. SOLUTION: In a manufacturing apparatus for an electrophotographic photoreceptor, the cylindrical substrate of the electrophotographic photoreceptor is coated with a hardening monomer or oligomer, and the monomer or oligomer is polymerized or crosslinked to be hardened by electron beam irradiation while rotating the substrate around the axis and then heated/temperature-controlled by a heater. The manufacturing apparatus is equipped with a cylindrical substrate rotary unit which supports the holding rotating shaft of the cylindrical substrate together with a rotary gear to rotationally drive the rotating shaft around its axis, and which can be inserted into and released from the main body of the manufacturing apparatus so that the minimum distance between the surface of the cylindrical substrate and the irradiation window of the electron beam irradiation apparatus is kept constant without depending on the outer diameter of the cylindrical substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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