发明名称 ION PLATING SYSTEM
摘要 PROBLEM TO BE SOLVED: To uniformize the distribution of plasma in a plasma generation region. SOLUTION: The inside of a vacuum chamber 1 is equipped with: crucibles 31A and 31B provided with an electron gun directly below the same; magnets 32A and 32B for deflection each generating a deflected magnetic field for introducing an electron beam from the electron gun into an evaporation material in the crucible; a substrate dome 7 provided with substrates 6a, 6b...; an electron gun for plasma generation feeding an electron beam into the vacuum chamber 1; and a floating electrode 20 surrounding plasma generated in the chamber 1. The crucibles 31A and 31B are arranged at the same distance from the electron gun for plasma generation. The magnets 32A and 32B for deflection are arranged so that the magnetic fields parallel and vertical to the central axis C of the electron gun for plasma generation are generated, respectively. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005036252(A) 申请公布日期 2005.02.10
申请号 JP20030197691 申请日期 2003.07.16
申请人 JEOL LTD 发明人 SHIMIZU YASUSHI;MANO YOSHIO
分类号 C23C14/32;H01J37/32;(IPC1-7):C23C14/32 主分类号 C23C14/32
代理机构 代理人
主权项
地址