发明名称 |
Electron beam exposure apparatus and electron beam measurement module |
摘要 |
An electron beam exposure apparatus for exposing wafer by using an electron beam includes: an electron beam generator for generating the electron beam; a wafer stage for holding the wafer to be exposed; a current detector, provided on the wafer stage, for detecting a current of the electron beam; and a storage unit, provided on the wafer stage, for storing information indicating the current detected by the current detector.
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申请公布号 |
US2005023486(A1) |
申请公布日期 |
2005.02.03 |
申请号 |
US20030624423 |
申请日期 |
2003.07.21 |
申请人 |
ADVANTEST CORPORATION;CANON KABUSHIKI KAISHA;HITACHI, LTD. |
发明人 |
TAKAKUWA MASAKI;NAKAYAMA YOSHINORI;NAKAMURA GEN |
分类号 |
G03F7/20;H01J37/04;H01J37/18;H01J37/304;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):A61N5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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