FORMING METHOD OF POLISHING PAD WITH PLURALITY OF CIRCULAR GROOVES AND POLISHING PAD STRUCTURE

摘要

PURPOSE: A structure and a method for forming a polishing pad are provided to increase efficiency of a slurry and to reduce costs by forming circular grooves on the polishing pad and by inserting a pad substance in the groove. CONSTITUTION: A polishing pad(22) of a CMP(Chemical Mechanical Polishing) equipment is prepared. A plurality of circular grooves are formed on the polishing pad. A pad substance(24) is inserted in the circular groove. The structure of the groove has K-groove shape. Polyurethane is used as the polishing pad, and polytex is used as the pad substance.