发明名称 Method for inspecting defects and an apparatus for the same
摘要 The present invention provides a highly sensitive inspection technology that prevents false detections. The present invention includes means for detecting an image of an entire chip. Using this image, inspection regions are defined based on criticality. Detection sensitivities can be set for each of these inspection sensitivities. Alternatively, false detections can be eliminated in post-inspection processing by recording characteristic values used to evaluate defects, e.g., concentration differences, in the inspection results. Furthermore, by providing a system that allows sharing of inspection conditions and the like needed by multiple inspection devices, the time required for determining inspection conditions can be shortened and stability and reliability can be monitored.
申请公布号 US6850320(B2) 申请公布日期 2005.02.01
申请号 US20010906678 申请日期 2001.07.18
申请人 HITACHI, LTD. 发明人 SHIBATA YUKIHIRO;MAEDA SHUNJI;KEMBO YUKIO
分类号 G01B11/30;G01N21/95;G01N21/956;G01N23/205;H01L21/66;(IPC1-7):G01N21/00;G06K9/00 主分类号 G01B11/30
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