发明名称 Darkfield inspection system having a programmable light selection array
摘要 An inspection tool embodiment includes an illumination source for directing a light beam onto a workpiece to generate scattered light that includes the ordinary scattering pattern of the workpiece as well as light scattered from defects of the workpiece. The embodiment includes a programmable light selection array that receives light scattered from the workpiece and selectively directs the light scattered from defects onto a photosensor which detects the defect signal. Processing circuitry receives the defect signal and conducts surface analysis of the workpiece that can include the characterizing of defects of the workpiece. The programmable light selection arrays can include, but are not limited to, reflector arrays and filter arrays. The invention also includes associated surface inspection methods.
申请公布号 US2005018179(A1) 申请公布日期 2005.01.27
申请号 US20030714257 申请日期 2003.11.14
申请人 KLA-TENCOR TECHNOLOGIES CORPORATION 发明人 BEVIS CHRISTOPHER F.;SULLIVAN PAUL J.;SHORTT DAVID W.;KREN GEORGE J.
分类号 G01N21/47;G01N21/88;(IPC1-7):G01N21/00 主分类号 G01N21/47
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