发明名称 EXPOSURE SYSTEM FOR MANUFACTURE OF FLAT PANEL DISPLAY, AND UNIT MAGNIFICATION ANNULAR OPTICAL SYSTEM FOR MANUFACTURE OF FLAT PANEL DISPLAY
摘要 PROBLEM TO BE SOLVED: To provide a large view field projection optical system for the manufacture of a large flat panel display, the optical system having a magnification factor and an aberration correction function for preventing one or a plurality of problems and defects in conventional techniques. SOLUTION: The exposure system for the manufacture of a flat panel display (FPD) includes a reticle stage to support a reticle, a substrate stage to support a substrate, and a reflective optical system to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. When an image of the reticle is projected onto the substrate by beams reflected by the first mirror, the secondary mirror and the second mirror, the reflective optical system has sufficient degrees of freedom for both alignment and aberration correction. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005025199(A) 申请公布日期 2005.01.27
申请号 JP20040194590 申请日期 2004.06.30
申请人 ASML HOLDING NV 发明人 HARNED ROBERT D;DE JAGER PATRICK;GUI CHENG-QUN
分类号 G02B17/00;G02B17/06;G03B27/52;G03F7/20;G09F9/00;H01L21/027;(IPC1-7):G03F7/20 主分类号 G02B17/00
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