发明名称 |
ELECTROPLATING METHOD, AND ELECTROPLATING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a technique where the formation of pinholes in a plating film can be prevented by effectively removing organic foreign matter in a plating liquid at a low cost. SOLUTION: The electroplating apparatus 100 is provided with: a plating tank 1 filled with a plating liquid; and a pair of anodes 7 and a cathode 9 dipped into the plating liquid 50 during plating. A magnet 11 is arranged inside the plating tank 1. The magnet 11 has a magnetic force of a magnitude which is enough to prevent an organic matter/metal joined body from being detached after it is attracted to the magnet (generally,≥0.25 teslas as surface magnetic flux density). COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005023389(A) |
申请公布日期 |
2005.01.27 |
申请号 |
JP20030191570 |
申请日期 |
2003.07.04 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MITSUI YOJI;KANBE TADASHI;OKONOGI ITARU |
分类号 |
C25D5/00;C25D17/00;C25D21/18;(IPC1-7):C25D5/00 |
主分类号 |
C25D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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