SUBSTRATE PROCESSING APPARATUS WITH AUXILIARY ELECTRODE FOR IMPROVING CLEANING EFFICIENCY AND REDUCING CLEANING TIME

摘要

PURPOSE: A substrate processing apparatus is provided to improve cleaning efficiency and to reduce cleaning time by using an additional auxiliary electrode as well as a lower electrode for generating a strong electric field adequate to form a strong cleaning plasma. CONSTITUTION: A substrate processing apparatus(300) includes a process chamber(302), a lower electrode and an auxiliary electrode. The lower electrode(310) is installed in the process chamber. The lower electrode is used for supporting a substrate and transforming a cleaning gas into a cleaning plasma during a cleaning process. The auxiliary electrode is installed over the lower electrode to form an additional cleaning plasma.