发明名称 Method and apparatus for delivering process gas to a process chamber
摘要 A gas delivery system for a plasma apparatus including a first plate having a gas inlet, and a second plate having a plurality of holes. The second plate is coupled to the first plate and spaced apart from the second to form a plenum chamber. A baffle honeycomb core is disposed between the first plate and the second plate in side the plenum chamber. The honeycomb core can be comprised of one or more spaced apart honeycomb panels. A surface of one of the honeycomb panels or a surface of the first panel can be contoured to control the pressure distribution of a gas in the plenum chamber. The gas delivery assembly for a plasma apparatus also includes a first plate having a gas inlet and a second plate coupled to the first plate to form a plenum chamber therebetween. The second plate includes a gas injection plate having a plurality of holes. The gas injection plate has a contoured surface such that a length of each of the plurality of holes varies depending on location of the holes on the contoured surface.
申请公布号 US2005011447(A1) 申请公布日期 2005.01.20
申请号 US20040889220 申请日期 2004.07.13
申请人 TOKYO ELECTRON LIMITED 发明人 FINK STEVEN T.
分类号 C23C16/00;C23C16/44;C23C16/455;C23C16/509;H01J37/32;(IPC1-7):C23C16/00 主分类号 C23C16/00
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