发明名称 X-ray illumination optical system and x-ray reduction exposure apparatus
摘要 An X-ray illumination optical system includes a reflection type integrator, having cylindrical surfaces, for reflecting an X-ray beam, and a concave mirror, including a rotational parabolic surface mirror, for reflecting the X-ray beam reflected by the integrator and for illuminating an object with the X-ray beam.
申请公布号 US6504896(B2) 申请公布日期 2003.01.07
申请号 US19970917373 申请日期 1997.08.26
申请人 CANON KABUSHIKI KAISHA 发明人 MIYAKE AKIRA;TSUKAMOTO MASAMI
分类号 G21K5/02;G03F7/20;G21K1/06;H01L21/027;(IPC1-7):G21K5/00 主分类号 G21K5/02
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