METHOD OF MANUFACTURING ELECTRONIC DEVICE FOR FORMING RADIATION-SENSITIVE COMPOSITION FOR DEVELOPING HIGH-ASPECT RATIO PATTERN AT HIGH RESOLUTION

摘要

PURPOSE: A method of manufacturing an electronic device is provided to form a radiation-sensitive composition for developing a high-aspect ratio pattern at high resolution by using a supercritical or near-supercritical carbon dioxide. CONSTITUTION: A substrate is prepared. A resist composition at least substantially including a polymer is applied to the substrate in order to form a resist layer. The resist layer is selectively exposed to radiation in a predetermined pattern. The polymer has a molecular weight providing a solubility parameter equal to or lower than a solubility parameter of supercritical carbon dioxide. The patterned resist using the supercritical carbon dioxide is developed at a pressure of 200 atm or less in order to form a resist pattern.