ETCHING METHOD FOR MICROMACHINING CRYSTALLINE MATERIAL AND DEVICE MANUFACTURED BY THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an etching method for micromachining a crystalline material and to provide a device manufactured by using the method. SOLUTION: The invention relates to a method for combining directional ion etching and anisotropic wet etching and to a device and a structure fabricated thereby. The invention is particularly applicable to silicon micromachining and provides architectures that combines crystallographic surfaces and vertical dry-etched surfaces together in the same structure. COPYRIGHT: (C)2005,JPO&NCIPI