METHOD FOR FORMING LOWER ELECTRODE OF CAPACITOR TO PREVENT LEANING AND LIFTING OF LOWER ELECTRODE USING LOW-K DIELECTRIC FILM AS SACRIFICIAL LAYER

摘要

PURPOSE: A method for forming a cylindrical lower electrode of a capacitor is provided to prevent leaning and lifting of the lower electrode by using a low-k dielectric film as a capacitor sacrificial layer. CONSTITUTION: A sacrificial layer(49) made of a low-k dielectric film is formed on a substrate(40). A lower electrode region(52) is defined by etching the sacrificial layer using a photoresist pattern(50). A conductive layer is formed on the lower electrode region. A photoresist layer is applied on the conductive layer. Isolated lower electrodes are formed by removing the conductive layer and the photoresist layer to expose the sacrificial layer. The exposed sacrificial layer is removed by O2 plasma.