发明名称 |
TRAPPING DEVICE, PROCESSING SYSTEM, AND METHOD FOR REMOVING IMPURITIES |
摘要 |
<p>A trapping device is disclosed which is arranged in a vacuum exhaust system (6) for removing gaseous impurities contained in the exhaust gas flowing through the vacuum exhaust system (6) which has a vacuum pump (36) for vacuum exhausting a processing unit (10) wherein a certain process is conducted on a semiconductor wafer. The trapping device comprises an impurity collecting chamber (50) arranged along the exhaust passage in the vacuum exhaust system (6) and a nozzle means (64) which injects a working fluid that is in a supersonic state due to adiabatic expansion for mixing the fluid with the exhaust gas and lowering the temperature of the exhaust gas to or below the critical points of the impurities within the impurity collecting chamber (50).</p> |
申请公布号 |
WO2005000440(A1) |
申请公布日期 |
2005.01.06 |
申请号 |
WO2004JP08759 |
申请日期 |
2004.06.22 |
申请人 |
TOKYO ELECTRON LIMITED;KOMATSU, TOMOHITO |
发明人 |
KOMATSU, TOMOHITO |
分类号 |
B01D53/68;B01D8/00;B01D53/34;C23C16/44;H01L21/31;(IPC1-7):B01D8/00 |
主分类号 |
B01D53/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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