POLISHING COMPOSITION AND METHOD FOR POLISHING SUBSTRATE USING THE COMPOSITION
摘要
<p>A polishing composition characterized in that the composition is boehmite-free and comprises water, abrasive grains, a polishing accelerator, and an organic acid ammonium salt or an inorganic acid ammonium salt. The polishing composition provides a high-quality polished surface without surface defects while a high polishing rate is maintained.</p>
