发明名称 |
METHOD AND SYSTEM FOR ELECTROLESS PLATING THIN NICKEL FILM BY FLOWING PLATING SOLUTION ONTO SURFACE OF WORKPIECE |
摘要 |
PURPOSE: To provide thin film plating method and system capable of performing plating having a constant thickness without dipping of a work to be plated into a solvent when the work has a complicated structure to which electroplating or electroless plating is difficult to be applied although it has corrosion resistance and wear resistance, and to provide method and system capable of plating a narrow gap formed between parts. CONSTITUTION: The system(10) for electroless plating a thin nickel film comprises a plural tanks(15); driving units(16) capable of respectively extracting contents inside the tanks to the outside; a plating solution input/output part(14) comprising one or more plating solution input/output pipes connected to an end of valves to flow a plating solution, wherein the plating solution input/output pipes comprise a bladder mounted on an outer portion of the plating solution input/output pipes and inflatable when a fluid flows in the bladder, wherein the plating solution input/output pipes are easily inserted between a narrow gap of parts, and the gap is easily sealed by expansion of the bladder, and wherein the bladder is formed in a doughnut shape into the center of which a hole is penetrated, and a plural plating solution input/output pipes are mounted on the bladder.
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申请公布号 |
KR20040099888(A) |
申请公布日期 |
2004.12.02 |
申请号 |
KR20030032019 |
申请日期 |
2003.05.20 |
申请人 |
HWANG, IL SOON;KIM, JI HYUN;LEE, NA YOUNG |
发明人 |
HWANG, IL SOON;KIM, JI HYUN;LEE, NA YOUNG |
分类号 |
C23C18/54;(IPC1-7):C23C18/54 |
主分类号 |
C23C18/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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