| 摘要 |
A POLISHING COMPOSITION FOR POLISHING A MEMORY HARD DISK, WHICH COMPRISES WATER AND AT LEAST ONE ABRASIVE SELECTED FROM THE GROUP CONSISTING OF SILICON DIOXIDE, ALUMINUM OXIDE, CERIUM OXIDE, ZIRCONIUM OXIDE, TITANIUM OXIDE, SILICON NITRIDE AND MANGANESE DIOXIDE AND WHICH FURTHER CONTAINS AN IRON CHELATE COMPLEX DISSOLVED IN THE COMPOSITION, THE IRON CHELATE COMPLEX HAVING A NITROGEN-CONTAINING COMPOUND AS A LIGAND, AND THE PH OF THE ENTIRE COMPOSITION BEING FROM 6 TO 10.
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