摘要 |
PROBLEM TO BE SOLVED: To provide a heat development apparatus which suppresses uneven development due to contamination of a transport guide plate adjacent to a heat drum in the heat development apparatus by development over a long period of time. SOLUTION: In a heat development apparatus for heat-developing a heat developable photosensitive material containing a photosensitive silver halide, an organic silver salt and a reducing agent on at least one surface of a support and further containing at least one selected from a compound represented by formula (1), a compound represented by formula (2) and a hydrazine compound, a slip material is disposed on a transport guide plate for a heat developable photosensitive material disposed next to a heat drum of the heat development apparatus. Thus, the objective heat development apparatus is obtained which suppresses uneven development due to contamination of a transport guide plate adjacent to a heat drum in the heat development apparatus by development over a long period of time. COPYRIGHT: (C)2005,JPO&NCIPI
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