发明名称 METHOD FOR REMOVING IMPURITY COMPOSED OF COMPOUND CONTAINING OH GROUP IN MOLECULE
摘要 PROBLEM TO BE SOLVED: To efficiently remove impurities containing an OH group in the molecule such as a minute amount of water, etc., having difficulty in removal under reduced pressure from a compound even in the case of a compound such as ethylmethylimidazolium tetrafluoroborate having extremely high hydrophilicity without admixture of metal impurities and requiring a filtration process. SOLUTION: The method for removing impurities comprises using at least one silicon compound selected from the group consisting of a monohalosilane compound such as trimethylchlorosilane, etc., a monoalkoxysilane compound such as methoxytrimethylsilane, etc., a monoaryloxysilane compound such as phenoxytrimethylsilane, etc., and a monoaminosilane compound such as bis(trimethylsilyl)amine, etc. Since the silicon compound is reacted with the OH group of the impurities into a highly volatile substance, the substance is readily removed under pressure. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004315400(A) 申请公布日期 2004.11.11
申请号 JP20030109732 申请日期 2003.04.15
申请人 TOKUYAMA CORP 发明人 IWATA ARIHIRO;MATSUNAGA TOMONORI
分类号 C07D233/58;C07B63/02;C07C209/84;C07C211/63;(IPC1-7):C07B63/02 主分类号 C07D233/58
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