GAS FOR PLASMA PROCESSING

摘要

PROBLEM TO BE SOLVED: To provide a gas for plasma processing capable of enhancing the plasma processing capabilities.

SOLUTION: The gas for plasma processing is introduced between electrodes 1, 1 facing each other when generating a plasma 3 under a pressure near the atmospheric pressure by applying voltages between the electrodes 1, 1 facing each other and applying a plasma processing on the surface of an object 4 to be processed by the plasma 3. The concentration of oxygen against nitrogen is 0.01-0.7% in volume ratio. Thereby, oxygen excited species can be made to exist stably in the generated plasma 3.

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