FINE WORKING METHOD AND FINE STRUCTURE OF TRANSPARENT MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a fine working method in which an etched pattern is formed on a surface of a transparent material, and a pattern of an organic thin film is formed, and to provide a fine working method and a fine structure in which a patterned multi-layered organic thin film is formed.

SOLUTION: In the fine working method for forming a patterned organic thin film and an etched surface on a surface of a transparent substrate by irradiating the transparent substrate with laser beams, an organic thin film layer is deposited on the surface of the transparent substrate, and fluid substance with strong absorption in laser beam wavelength is brought into contact with the surface of the transparent substrate. The transparent substrate and the fine structure having the patterned organic thin film and the etched surface are obtained by irradiating laser beams of the intensity from 0.01 J/cm2/pulse to 100 J/cm2/pulse from the side opposite to the organic thin film layer of the transparent substrate.

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