| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus in which a substrate can be efficiently conveyed. SOLUTION: The conveyance equipment 1 is equipped with two forks 10, 10 arranged in parallel so as to hold a substrate 50 on the forks 10, 10. The fork 10 has a sucking mechanism to suck the substrate 50. The fork 10 has the length almost equal to the length of a carrying-in device 2 and a platen 3 or to the length of the platen 3 and the reversing machine 4 (L1+L2) so that one substrate 50 can be moved from the carrying-in device 2 to the platen 3 while another substrate 51 can be moved from the platen 3 to the reversing machine 4. The forks 10, 10 are extended from the transfer base 11, and the transfer base 11 is slidably supported on a pair of rails 12 installed on both sides of the carrying-in device 2 and is moved in the distance corresponding nearly to the distance of L1 or L2 over the rails 12 driven by a driving device 19. COPYRIGHT: (C)2005,JPO&NCIPI
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