发明名称 |
Positive photoresist composition |
摘要 |
Provided is a positive photoresist composition comprising a resin which contains specific repeating units and whose dissolving rate toward an alkaline developing solution is increased by the action of an acid and a compound which generates an acid upon irradiation with an actinic ray or a radiation.
|
申请公布号 |
US6808860(B2) |
申请公布日期 |
2004.10.26 |
申请号 |
US20010834639 |
申请日期 |
2001.04.16 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
SATO KENICHIRO;AOAI TOSHIAKI |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|