发明名称 |
Apparatus for treating substrates |
摘要 |
The aim of the invention is to attain a uniform and homogeneous treatment of substrates in a device comprising at least one process container which is arranged in a gas atmosphere and which contains a treatment fluid. Said process container also comprises at least two openings which are located underneath a treatment fluid surface and through which the substrates are linearly guided. In addition, an overflow for the treatment fluid is provided.
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申请公布号 |
US6799588(B1) |
申请公布日期 |
2004.10.05 |
申请号 |
US20020031923 |
申请日期 |
2002.04.17 |
申请人 |
STEAG MICROTECH GMBH;IMEC |
发明人 |
SPEH ULRICH;SCHNEIDER JENS;MEURIS MARC |
分类号 |
B08B3/12;H01L21/00;H01L21/304;(IPC1-7):B08B3/04 |
主分类号 |
B08B3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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