发明名称 |
METHOD FOR THE PRODUCTION OF A MEMORY CELL, MEMORY CELL AND MEMORY CELL ARRANGEMENT |
摘要 |
The invention relates to a method for the production of a memory cell, a memory cell and a memory cell arrangement. According to the inventive method for the production of a memory cell, a first electrically conductive area (311) is formed in and/or on a substrate (301). A second electrically conductive area (312) is also formed at a given distance from the first electrically conductive area such that a cavity (321) is formed between the first and second electrically conductive areas. The first and second electrically conductive areas are configured in such a way that when a first voltage is applied to the electrically conductive areas, a structure is formed from material from at least one of said electrically conductive areas, at least partially bridging over the distance between the electrically conductive areas. When a second voltage is applied to the conductive areas, the material of the structure at least partially bridging over the distance between the electrically conductive areas recedes. |
申请公布号 |
WO2004051763(A3) |
申请公布日期 |
2004.09.30 |
申请号 |
WO2003DE03935 |
申请日期 |
2003.11.27 |
申请人 |
INFINEON TECHNOLOGIES AG;HOFMANN, FRANZ;KREUPL, FRANZ |
发明人 |
HOFMANN, FRANZ;KREUPL, FRANZ |
分类号 |
G11C13/02;G11C16/02;H01L27/24;H01L45/00 |
主分类号 |
G11C13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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