| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To rapidly replace the gas in a pellicle space while suppressing the deformation of a pellicle structure. <P>SOLUTION: The gas replacement mechanism or the gas replacement method replaces the gas in the space closed by a photomask substrate and pellicle structure of the photomask in which the pattern forming surface of the photomask substrate is protected by the pellicle structure composed of a frame and a pellicle stretched to be installed to the frame. The mechanism has a gas supplying means connected to a vent hole disposed at the frame, thereby supplying the gas into the space. Also, the gas supplying means has a suction means for sucking the gas between the gas supplying means and the frame, thereby offsetting the force acted on the frame by the supply in supplying the gas. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
