INLINE EQUIPMENT IN WHICH SPINNER AND EXPOSURE APPARATUS ARE COUPLED

摘要

PURPOSE: Inline equipment in which a spinner and an exposure apparatus are coupled is provided to reduce an interval of transfer time of a wafer and simplify a system for transferring the wafer by decreasing an unnecessary buffer region between the spinner and the exposure apparatus. CONSTITUTION: The spinner(86) performs a deposition process and a development process on the wafer. A stepper is separated from the spinner by a predetermined interval. An interface(84) transfers the wafer between the spinner and the stepper, positioned between the spinner and the stepper. The inline equipment includes a preliminary aligning apparatus(82) for aligning the wafer, positioned between the interface and the stepper.