发明名称 |
METHOD OF ENHANCING PHASE SHIFT MASKS |
摘要 |
A mask generation method can enhance clear field phase shift masks using a chrome border around phase 180 regions. An exemplary method involves identifying edges of a 180 degree phase pattern, expanding these edges, and merging the expansions with chrome. An alternative method involves oversizing and undersizing phase 180 data, taking the difference, and merging the difference with chrome. The chrome region on the phase mask can improve mask generation by allowing the chrome on the mask to fully define the quartz etch. |
申请公布号 |
EP1454191(A1) |
申请公布日期 |
2004.09.08 |
申请号 |
EP20020795795 |
申请日期 |
2002.12.09 |
申请人 |
ADVANCED MICRO DEVICES INC. |
发明人 |
LUKANC, TODD, P.;SPENCE, CHRISTOPHER, A. |
分类号 |
G03F1/26;G03F1/00;G03F1/30;G03F1/68;H01L21/027 |
主分类号 |
G03F1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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