发明名称 N-TYPE DIAMOND SEMICONDUCTOR AND ITS MANUFACTURING METHOD
摘要 <p>A sulfur-doped n-type diamond semiconductor characterized in that a diamond semiconductor is grown on the (100)-face of a diamond substrate where the angle (off angle) of the normal of the diamond substrate to the normal of the &lt;100&gt;-direction is 1.5 degrees or less by a microwave CVD method using a sulfur source in a diamond synthesis atmosphere. Its manufacturing method and an ultraviolet light-emitting diode using the sulfur-doped n-type diamond semiconductor are also disclosed. The sulfur-doped n-type diamond semiconductor is manufactured with a good reproducibility and is useful for high-efficiency high-luminance ultraviolet light-emitting diodes.</p>
申请公布号 WO2004075273(A1) 申请公布日期 2004.09.02
申请号 WO2004JP02150 申请日期 2004.02.24
申请人 TOKYO GAS COMPANY LIMITED;KAWAMURA, AKI;HORIUCHI, KENJI;ISHIKURA, TAKEFUMI;IDE, TAKAHIRO;OKAJIMA, YUICHIRO 发明人 KAWAMURA, AKI;HORIUCHI, KENJI;ISHIKURA, TAKEFUMI;IDE, TAKAHIRO;OKAJIMA, YUICHIRO
分类号 C30B25/10;C30B25/18;H01L21/205;H01L29/04;H01L29/16;H01L29/167;H01L33/16;H01L33/34;(IPC1-7):H01L21/205;C30B29/04;H01L33/00 主分类号 C30B25/10
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