摘要 |
A process for refining a crude resin for a resist is provided, which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The process provides a refining process for the crude resin of a resist resin (A) used in a photoresist composition comprising at least the resist resin (A) and an acide generator (B) dissolved in a first organic solvent (C1), wherein if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution comprising the crude resin of the component (A) dissolved in a second organic solvent (C2) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered. |
申请人 |
TOKYO OHKA KOGYO CO., LTD.;HADA, HIDEO;IWAI, TAKESHI;MIYAIRI, MIWA;MUROI, MASAAKI;ATSUCHI, KOTA;TOMIDA, HIROAKI |
发明人 |
HADA, HIDEO;IWAI, TAKESHI;MIYAIRI, MIWA;MUROI, MASAAKI;ATSUCHI, KOTA;TOMIDA, HIROAKI |