PHOTO MASK BLANK, PHOTO MASK, METHOD AND APPARATUS FOR FABRICATING PHOTO MASK BLANK TO IMPROVE REGENERATION AND YIELD

摘要

PURPOSE: A method for fabricating a photo mask blank is provided to improve regeneration and yield by forming a high-quality and high-stability photo mask blank suitable for fabricating a photo mask with a miniaturized structure. CONSTITUTION: A substrate(50) and a target(40) are supplied to a vacuum chamber(12). The first particle beam is provided. The first particle beam(22) is irradiated to perform a sputtering process on the target. At least the first layer made of the first material is deposited on the substrate. The first particle beam faces the substrate, and the sputtered particles are emitted from the target toward the substrate. At least the second layer made of the second material is deposited on the photo mask blank.