发明名称 CHAMBER FOR VACUUM
摘要 PROBLEM TO BE SOLVED: To provide a new chamber for vacuum, resolving conventional problems like outgassing by applying special coating to an inner surface of the chamber for vacuum. SOLUTION: This chamber for vacuum is composed by forming a coating layer of a silica ceramic film made by applying and heating a polysilazane organic solvent solution to whole the inner wall of the chamber made of a metallic material. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004230283(A) 申请公布日期 2004.08.19
申请号 JP20030021708 申请日期 2003.01.30
申请人 UCHIDA KAZUTO;COSMO TEKKU KK 发明人 UCHIDA KAZUTO
分类号 B01J3/00;B01J19/00;(IPC1-7):B01J3/00 主分类号 B01J3/00
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