| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposing method and an exposing device capable of achieving exposure in a short time via a proximity gap. SOLUTION: This exposing method exposing by facing a substrate 100 to a photomask 5 via the proximity gap P comprises processes of: specifying height of the surface of the substrate; and relatively moving the photomask and the substrate along the substrate, while relatively vertically moving the photomask and the substrate so that a gap between the photomask and the substrate is maintained within a proper range of the proximity gap, based on the specified height. COPYRIGHT: (C)2004,JPO&NCIPI |
