发明名称 |
BONDING PAD OF SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: A bonding pad of a semiconductor device is provided to concentrate pressure stress generated in a bonding process on the surface of a pad by forming unevenness of an embossed type on the pad in a CMP(chemical mechanical polishing) process. CONSTITUTION: An uppermost metal layer and an uppermost via hole are uniformly distributed in a bonding pad of a semiconductor device. The concave part and the convex part of the uppermost metal layer are formed of an embossed type. The uppermost metal layer constitutes a concave part in a region of a horizontal via hole(40).
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申请公布号 |
KR20040070908(A) |
申请公布日期 |
2004.08.11 |
申请号 |
KR20030007137 |
申请日期 |
2003.02.05 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BONG, WON HYEONG |
分类号 |
H01L21/60;(IPC1-7):H01L21/60 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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