| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for charged particle beam lithography by which the increase of the volume of pattern data can be prevented even when the design data address of the pattern data is not the integral multiple of the address of lithography equipment. SOLUTION: Fig. (a) shows a pattern to be plotted prepared by means of an unscaled CAD and Fig. (b) shows the data structure of the pattern. In this case, the address unit of CAD data is set to 5. When the scaling value is set to 0.9, the data having a scaling value of 0.9 is added to the data structure transformed for the lithography device as shown in Fig. (c). The pattern data subjected to data transformation in this way are sent to a data transfer circuit 13 and released from the compressed state. Then scaling is performed on each graphic contained in the pattern data with respect to the size or position of the graphic. COPYRIGHT: (C)2004,JPO&NCIPI
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