发明名称 AROMATIC ESTER DERIVATIVE AND RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide an aromatic ester derivative giving a radiation-sensitive resin composition having excellent resolution and focal depth latitude for especially a KrF excimer laser and provide a radiation-sensitive resin compound compounded with the aromatic ester derivative. <P>SOLUTION: The aromatic ester derivative is expressed by formula (1), formula (2) or formula (3) (R<SP>1</SP>to R<SP>8</SP>are each H or an alkyl; X is a single bond; and a<SB>1</SB>to a<SB>8</SB>are each an integer satisfying the relationships of 0&le;a<SB>1</SB>+a<SB>3</SB>&le;5, 0&le;a<SB>2</SB>+a<SB>4</SB>&le;5, 1&le;a<SB>1</SB>+a<SB>2</SB>&le;10, 1&le;a<SB>5</SB>+a<SB>6</SB>&le;8 and 1&le;a<SB>7</SB>+a<SB>8</SB>&le;6). <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004210744(A) 申请公布日期 2004.07.29
申请号 JP20030002374 申请日期 2003.01.08
申请人 JSR CORP 发明人 NAGAI TOMOKI;YADA YUJI;MIYAJI MASAAKI
分类号 G03F7/004;C07C69/76;C08K5/00;C08K5/10;C08L101/02;G03F7/039;H01L21/027 主分类号 G03F7/004
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