发明名称 Ridge-waveguide semiconductor laser device
摘要 A laser device includes a double hetero-structure element constructed by depositing a p-type cladding layer, a quantum well active layer, an n-type thin first cladding layer and an n-type thick second cladding layer sequentially. A ridge-waveguide is shaped between two trenches formed in the second cladding layer. The first cladding layer serves as an etching stopper while etching the second cladding layer to form the two trenches. The trenches reach to or reach in vicinity to the surface of the first cladding layer. High-resistance regions may be formed in portions of the first cladding layer directly underneath the trenches. The thin first cladding layer, suppresses leakage current and improves the temperature characteristics and the operating speed characteristics of the laser device.
申请公布号 US6768760(B2) 申请公布日期 2004.07.27
申请号 US20020260280 申请日期 2002.10.01
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MIHASHI YUTAKA;TAKIGUCHI TOHRU;HANAMAKI YOSHIHIKO
分类号 H01S5/22;H01S5/12;H01S5/20;H01S5/223;H01S5/32;H01S5/343;(IPC1-7):H01S5/00 主分类号 H01S5/22
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