| 摘要 |
PROBLEM TO BE SOLVED: To provide a system for producing a semiconductor in which deterioration, e.g. deformation or damage, of a stencil mask being employed in a semiconductor production process is suppressed. SOLUTION: In the system for producing a semiconductor, a stencil mask 10 having a thin film part 12 and a part 15 for supporting the thin film part 12 is irradiated with a particle beam 16 and a substrate to be processed is irradiated with the particle beam 16 through an opening 17 formed at the thin film part 12 of the stencil mask 10. In the process for fabricating a semiconductor device, the stencil mask 10 is irradiated with the particle beam 16 while adjusting the irradiation area of the particle beam 16 such that the end part of the irradiation area does not exist on the thin film part 12 of the stencil mask 10. COPYRIGHT: (C)2004,JPO&NCIPI
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