发明名称 LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING DEVICE, AND DEVICE MANUFACTURED THEREWITH
摘要 PROBLEM TO BE SOLVED: To improve the detection property of a present photodetector having a transformation layer so as to achieve the higher yield and restrain the generation of any ghost. SOLUTION: A lithography projector is provided with a radiation system for supplying a projection beam of primary radiation, a supporting structure for supporting a patterning means which acts to patternize a projection beam according to the required pattern, a substrate table for holding a substrate, a projection system for projecting the patternized beam on the target part of the substrate, and a radiation sensor which can move in a path in which the projection beam traverses, to accept the primary radiation from the projection beam. The sensor is provided with a radiation sensitive material which converts the incident primary radiation into the secondary radiation, a sensing means which can detect the secondary radiation from the radiation sensitive material, and a filter material for substantially blocking the secondary radiation from propagating in the direction that the secondary radiation gets away from the sensing means. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004186691(A) 申请公布日期 2004.07.02
申请号 JP20030404012 申请日期 2003.12.03
申请人 ASML NETHERLANDS BV 发明人 VAN DE KERKHOF MARCUS ADRIANUS;DE BOEIJ WILHELMUS PETRUS;HEMERIK MARCEL MAURICE
分类号 G21K5/00;G01J1/42;G01J1/58;G01T1/20;G02B5/26;G03F7/20;G21K5/02;H01L21/027;(IPC1-7):H01L21/027 主分类号 G21K5/00
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