发明名称 CRYSTALLINE SEMICONDUCTOR FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a crystalline semiconductor film which has high performance as compared with a conventional product, a method for manufacturing the crystalline semiconductor film, a semiconductor device using the semiconductor film, and a display device using the semiconductor device. SOLUTION: The crystalline semiconductor film contains a plurality of crystal grains, and crystal grains of which the <001> azimuth is≤±10°from a prescribed direction regulated in a film surface out of the plurality of crystal grains occupy≥70% of the whole crystal grains as an area. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004186559(A) 申请公布日期 2004.07.02
申请号 JP20020353801 申请日期 2002.12.05
申请人 SHARP CORP 发明人 TAKAGI MINORU;KANEKO TOSHIHIRO
分类号 H01L21/20;H01L21/336;H01L29/786;(IPC1-7):H01L21/20 主分类号 H01L21/20
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