发明名称 |
Modified antistatic compositions and thermally developable materials containing same |
摘要 |
Antistatic compositions include a fluorochemical that is a reaction product of RfCH2CH2-SO3H with an amine wherein Rf comprises 4 or more fully fluorinated carbon atoms. These antistatic compositions can be formulated in organic solvent-based conductive coating compositions, with or without hydrophobic binders, that can be used to form conductive layers in thermally developable materials including thermographic and photothermographic materials.
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申请公布号 |
US2004126718(A1) |
申请公布日期 |
2004.07.01 |
申请号 |
US20030736298 |
申请日期 |
2003.12.15 |
申请人 |
SAKIZADEH KUMARS;LABELLE GARY E.;OREM MICHAEL W.;BHAVE APARNA V. |
发明人 |
SAKIZADEH KUMARS;LABELLE GARY E.;OREM MICHAEL W.;BHAVE APARNA V. |
分类号 |
G03C1/76;C09K3/16;G03C1/38;G03C1/498;G03C1/74;G03C1/795;(IPC1-7):G03C1/498;G03C5/16;G03C1/37 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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